MARCH AP Batch Series

CKD Technology not only has brand new machines in stock, available immediately.

We also have detailed renting business, ready to serve your specific production requirement while significantly lowering your initial investment. Contact us for more details.

CKD has a team of professional engineers, ready to deliver turn key service.

For trading of used machines, please contact us via Whatspp or email.

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Overview

The AP series plasma treatment systems are suitable for a wide range of applications, including plasma cleaning, surface activation, and adhesion improvement. These systems serve sectors such as semiconductor manufacturing, microelectronics packaging and assembly, and the production of medical and life science equipment. The AP series comprises four batch plasma processing systems, offering small, medium, and large vacuum chamber options to accommodate customer needs ranging from R&D environments to various levels of production.

Features and Benefits of Plasma Treatment Systems

● PLC controller with touchscreen interface provides an intuitive graphical display and real-time process monitoring

● Flexible shelf design allows for the processing of various part carriers in either direct or downstream plasma modes

● 13.56 MHz RF generator with automatic impedance matching ensures unmatched process reproducibility

● Proprietary software control system generates process and production data for statistical process control (SPC)

● Batch-style operation; each unit is fully self-contained and requires minimal floor space

● Pump, chamber, control electronics, and 13.56 MHz RF generator are all housed within a single enclosure

Plasma Treatment System Models and Configurations

AP-600 & AP-300 Benchtop Plasma Treatment Systems: The AP-300 and AP-600 plasma treatment systems are benchtop units that are fully self-contained and require minimal workbench space. The system chassis houses the plasma chamber, control electronics, a 13.56 MHz RF generator, and an automatic chamber matching network (only the vacuum pump is located externally). Maintenance access is provided via interlocked doors or removable panels. The plasma chamber supports up to seven removable and adjustable powered or grounded shelves to accommodate various parts, assemblies, and carriers, including magazines, trays, and wafer boats. The vacuum plasma processing system accommodates a wide range of process gases, including argon, oxygen, hydrogen, helium, and fluorinated gases. Both models come standard with two (2) mass flow controllers for optimal gas control, with two (2) additional units available as options (up to four total). Convenient utility connections facilitate the periodic calibration required during validation processes.

AP-1000 Plasma Processing System: The AP-1000 platform allows for full front access, facilitating easy operation and maintenance of all internal components. The pump is mounted on casters for easy removal. The plasma chamber is constructed from 11-gauge stainless steel with aluminum fixtures, ensuring exceptional durability. The chamber features multiple removable and adjustable shelves to accommodate a variety of part carriers, including magazines, trays, wafers, and wafer boats. Equipped with optional HTP (High Throughput) shelves, the AP-1000 plasma processing system combines the reliability and process quality of the AP-1000 platform with the proven advantages of Nordson MARCH’s unique shelf design. The AP-1000 HTP optimizes the use of reactive ions within the RF plasma, enhancing processing uniformity while reducing cycle times. The AP-1000 HTP system supports a range of process gases, such as argon, hydrogen, and helium. It comes standard with four gas mass flow controllers to ensure optimal gas control. Slotted magazines are positioned vertically within the chamber.

Additionally, slotted magazines can be placed vertically inside the chamber. Typically, each magazine holds at least 20 lead frames. The AP-1000 plasma chamber can accommodate up to 12 magazines, depending on the magazine size.